Chemical Mechanical Polishing (CMP) Equipment and Materials

Chemical Mechanical Polishing (CMP) Equipment and Materials published by BCC Research in October, 2008. This report consists of 237 pages and the price starts from US $ 4850.

Introduction

Abstract

SCOPE OF REPORT

This study provides an updated review of chemical mechanical polishing technology, including equipment and materials, and identifies current and potential applications for this technology.

BCC Research determines the current market status of chemical mechanical polishing, defines trends, and presents forecasts of growth over the next 5 years. Technological issues, including the latest process developments, are also discussed.

BCC Research analyzes the CMP industry on a worldwide basis from the standpoint of both manufacturing and consumption. In addition, the study examines commercial and public research activities in major regions of the world. Research objectives and areas of interest related to equipment, materials, and applications of chemical mechanical polishing are also outlined.

More specifically, BCC' s market analysis is divided into five parts.

In the first part, a historical review of the CMP process is provided, including an outline of recent events. In addition, the report supplies a revised and detailed description of a typical CMP process and of recent equipment and process upgrades. In this section, current and emerging applications of chemical mechanical polishing are also identified and divided by sector (i.e., electronics and optics).

The second part of the report entails a global market analysis of CMP equipment and materials. Current technical issues are described, followed by a review of related, recent technological developments and patent abstracts. Global revenues (sales data in M$) for CMP equipment and materials are presented by product type, application, and region, with actual data referring to the years 2006, 2007, and estimated data for the year 2008.

This section is completed by a presentation of market growth trends, based on industry growth, technological trends, and regional trends. Projected revenues for CMP equipment and materials are reported, with forecast CAGR (compound annual growth rate) for the period 2008 through 2013.

In the third part, covering global industry structure, the report provides a complete list of suppliers of CMP equipment and materials with a description of their products. The analysis includes a description of the geographical distribution of these firms and an evaluation of production versus consumption for CMP equipment and materials, always from a geographical standpoint. Detailed company profiles of the top industry players and relative market share for the five leading companies are also provided.

In the fourth part of this study, an analysis of industry competitiveness is performed. This analysis encompasses a review of global research and development activities, with profiles of the most important R&D players divided by region, and an outline of the most critical factors contributing to industry competitiveness.

The fifth and final section includes extensive U.S. patent analysis, with a summary of patents related to CMP equipment, materials, process, and applications, issued during the period 2006 through 2008. Patent analysis is performed by region, country, assignee, patent category, application, and material type.

METHODOLOGY and INFORMATION SOURCES

The technology section of this report is based on information derived from technical literature, related BCC' s reports, professional journals, author' s field experience, and online sources.

Global market analysis was performed by analyzing 85 manufacturers of equipment and materials used in chemical mechanical polishing, accounting for at least 95% of the global market. Data for each company were obtained by thoroughly analyzing SEC filings, internet web sites, annual reports, industry directories, industry magazines and catalogs, government sources, and other public sources.

Additional data were obtained from the direct contribution of primary sources, including: company executives, managers, engineers and other technical personnel representing manufacturers and developers of materials and equipment for chemical mechanical polishing; representatives of academia and trade associations; and industry market analysts.

Table of Contents

Chapter 1: SUMMARY

• EXECUTIVE SUMMARY 8
• SUMMARY TABLE GLOBAL MARKET FOR CHEMICAL MECHANICAL POLISHING, THROUGH 2013 ($MILLIONS) 9
• SUMMARY FIGURE GLOBAL MARKET FOR CHEMICAL MECHANICAL POLISHING, 2006-2013 ($MILLIONS)

Chapter 2: OVERVIEW 17

• INTRODUCTION 11
• HISTORY OF CHEMICAL MECHANICAL POLISHING 11
• HISTORY OF CHEMICAL ........(CONTINUED) 12
• TABLE 1 CHEMICAL MECHANICAL POLISHING - TECHNOLOGICAL MILESTONES 13
• FIGURE 1 CHEMICAL MECHANICAL POLISHING - WORLDWIDE PATENT APPLICATIONS AND PATENTS ISSUED SINCE 1960 14
• FIGURE 1 (CONTINUED) 15
• CHEMICAL-MECHANICAL POLISHING: PROCESS AND EQUIPMENT 15
• POLISHING 15
• Requirements of a CMP Process 15
• TABLE 2 GENERAL REQUIREMENTS OF A CMP PROCESS 15
• Equipment and Process 15
• Dual Force Planarization 16
• Multiple Polishing Systems 17
• POST-CMP CLEANING 17
• Cleaning Steps and Chemistries 17
• Post-CMP Equipment Technology 18
• Wet Process 18
• Dry and Other Processes 19
• CURRENT AND EMERGING APPLICATIONS OF CHEMICAL MECHANICAL POLISHING 19
• TABLE 3 APPLICATIONS OF CHEMICAL MECHANICAL POLISHING BY INDUSTRY 20
• ELECTRONICS 20
• Microelectronics 20
• Semiconductor Devices 20
• TABLE 4 IC CONFIGURATIONS 21
• TABLE 5 TYPICAL APPLICATIONS OF CHEMICAL MECHANICAL POLISHING IN SEMICONDUCTOR MANUFACTURING 22
• Wafer Planarization 22
• Deep Trench Capacitor Fabrication 22
• Polysilicon Films 23
• Shallow Trench Isolation 23
• Pre-metal Dielectric Layers 23
• Inter-layer Dielectric Films 23
• Aluminum and Aluminum Alloys 24
• Metal Polishing for Vias and Contacts 24
• Damascene Process 24
• MEMS and NEMS 24
• Inkjet Printheads 25
• Data Storage Media and Recording Heads 25
• Magnetic Storage Media 25
• Recording Heads 26
• Advanced Displays 26
• OPTICS 26
• Lenses 26
• Color Filters for Image Sensors 26
• Sapphire Substrates

Chapter 3: GLOBAL MARKET 93

• ANALYSIS OUTLINE 28
• GLOBAL MARKET SUMMARY 28
• MARKET SEGMENTATION BY PRODUCT CATEGORY 28
• Market Segmentation by ........(Continued) 29
• TABLE 6 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES BY PRODUCT CATEGORY, THROUGH 2013 ($MILLIONS) 30
• FIGURE 2 CHEMICAL MECHANICAL POLISHING: GLOBAL MARKET BY PRODUCT CATEGORY, 2006-2013 ($MILLIONS) 31
• FIGURE 3 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY PRODUCT CATEGORY, 2008 AND 2013 (%) 31
• FIGURE 3 (CONTINUED) 32
• MARKET SEGMENTATION BY APPLICATION 32
• TABLE 7 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($MILLIONS) 33
• FIGURE 4 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY APPLICATION, 2008 AND 2013 (%) 34
• MARKET SEGMENTATION BY REGION 35
• TABLE 8 CHEMICAL MECHANICAL POLISHING: REVENUES BY REGION, THROUGH 2013 ($MILLIONS) 35
• FIGURE 5 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY REGION, 2008 AND 2013 (%) 36
• CMP EQUIPMENT 37
• BASIC EQUIPMENT DESIGN 37
• TABLE 9 BASIC CHEMICAL MECHANICAL POLISHING PROCESS 37
• CURRENT TECHNICAL ISSUES 37
• Uniform Polishing Pressure 37
• Carrier Head Position 37
• Determination of Polishing Endpoint 38
• Higher Production Throughput 38
• On-line Inspection 38
• Uniform Polishing Rate 38
• Reduction of Polishing Defects 39
• LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT 39
• Electro-chemical Mechanical Polishing 39
• Apparatuses and Methods for In-situ Endpoint Detection 40
• Laser Interferometer Detector 40
• Combined Eddy Current Sensing and Optical Monitoring 41
• System for Endpoint Detection in Copper Damascene Process 41
• Polishing Equipment with Pad Drum 42
• Chemical Mechanical Polishing Equipment with Rotating Belt 42
• CMP Equipment with Electromagnetic Coil 43
• CURRENT MARKET STATUS 43
• Current Market Summary 43
• Revenues by Equipment Type 43
• TABLE 10 SEMICONDUCTORS: REVENUES BY REGION, THROUGH 2008 ($ BILLIONS) 44
• FIGURE 6 SEMICONDUCTORS: REVENUES BY REGION, 2003-2008 ($ BILLIONS) 44
• TABLE 11 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY TYPE, THROUGH 2008 ($ MILLIONS) 45
• FIGURE 7 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES, 2003-2008 ($ MILLIONS) 46
• FIGURE 8 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY TYPE, 2008 (%) 46
• The Post-CMP Equipment Market 47
• TABLE 12 POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS TYPE, 2008 47
• Revenues by Application 47
• TABLE 13 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS) 48
• FIGURE 9 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY APPLICATION, 2008 (%) 48
• Revenues by Region 48
• Revenues ........(Continued) 49
• TABLE 14 CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION, THROUGH 2008 ($MILLIONS) 50
• FIGURE 10 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY REGION, 2008 (%) 50
• MARKET GROWTH TRENDS 51
• Semiconductor Industry Growth 51
• TABLE 15 FORECAST - SEMICONDUCTORS: REVENUES BY REGION, THROUGH 2013 ($BILLIONS) 51
• FIGURE 11 FORECAST - SEMICONDUCTORS: MARKET GROWTH BY REGION, 2008 AND 2013 ($ BILLIONS) 52
• Industry Growth for Other Emerging Applications 52
• Data Storage Media 53
• TABLE 16 FORECAST - HARD DISK DRIVES: GLOBAL PRODUCTION BY TYPE, THROUGH 2013 (MILLION UNITS) 53
• FIGURE 12 FORECAST - HARD DISK DRIVES: PRODUCTION SHARE BY TYPE, 2013 (% UNITS) 54
• TABLE 17 FORECAST - HARD DISKS: GLOBAL PRODUCTION BY TYPE, THROUGH 2013 (MILLION UNITS) 55
• FIGURE 13 FORECAST - HARD DISKS: GLOBAL PRODUCTION BY TYPE, 2008 AND 2013 (MILLION UNITS) 55
• FIGURE 14 FORECAST - HARD DISKS: PRODUCTION SHARE BY TYPE, 2013 (% UNITS) 56
• Recording Heads 56
• Advanced Displays 57
• TABLE 18 FORECAST - FLAT PANEL DISPLAYS: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($BILLIONS) 57
• FIGURE 15 FORECAST - FLAT PANEL DISPLAYS: GLOBAL REVENUES BY TYPE, 2008 AND 2013 (MILLION UNITS) 58
• FIGURE 16 FORECAST - FLAT PANEL DISPLAYS: MARKET SHARE BY TYPE, 2013 (%) 58
• Optics 59
• TABLE 19 FORECAST - OPTICS: GLOBAL MARKET GROWTH, THROUGH 2013 ($ BILLIONS) 59
• Technological Trends 59
• Regional Trends 60
• PROJECTED MARKET FOR CMP AND POST-CMP EQUIPMENT 61
• Key Observations 61
• TABLE 20 FACTORS AFFECTING SALES OF CMP AND POST-CMP EQUIPMENT, THROUGH 2013 61
• Market Forecast for CMP and Post-CMP Equipment 62
• Revenues by Application 62
• TABLE 21 FORECAST - CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION) 63
• FIGURE 17 FORECAST - CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY APPLICATION, 2013 (%) 63
• Revenues by Equipment Type 64
• TABLE 22 FORECAST - CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS) 64
• FIGURE 18 FORECAST - CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY TYPE, 2013 (%) 65
• Post-CMP Equipment Revenues by Process Type 65
• TABLE 23 FORECAST - POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS TYPE, THROUGH 2013 ($ MILLIONS) 66
• FIGURE 19 FORECAST - POST-CMP EQUIPMENT: MARKET SHARE BY PROCESS TYPE, 2013 (%) 66
• Revenues by Region 67
• TABLE 24 FORECAST - CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS) 67
• FIGURE 20 FORECAST - CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY REGION, 2013 (%) 68
• CMP SLURRIES 68
• TECHNOLOGY 68
• Abrasive Component 68
• Fumed Metal Oxides 69
• Precipitated Powders 69
• Other Slurry Components 69
• Slurry Compositions 70
• TABLE 25 SLURRIES FOR CHEMICAL-MECHANICAL POLISHING 71
• Oxide Slurry 72
• TABLE 26 SAMSUNG ELECTRONICS - OXIDE CMP SLURRY COMPOSITION 72
• Low-K Dielectric Slurry 73
• TABLE 27 CABOT MICROELECTRONICS - LOW-K DIELECTRIC CMP SLURRY COMPOSITION 73
• Polycrystalline Silicon Slurry 74
• TABLE 28 CHEIL INDUSTRIES - POLYCRYSTALLINE SILICON CMP SLURRY COMPOSITION 74
• Copper Slurry 74
• TABLE 29 MOTOROLA - COPPER CMP SLURRY COMPOSITION 75
• TABLE 30 CABOT MICROELECTRONICS - COPPER CMP SLURRY COMPOSITION 76
• TABLE 31 ROHM AND HAAS - COPPER CMP SLURRY COMPOSITION 77
• Tungsten Slurry 77
• TABLE 32 DUPONT AIR PRODUCTS - TUNGSTEN CMP SLURRY COMPOSITION 77
• CURRENT TECHNICAL ISSUES 77
• Minimization of Polishing Defects 78
• Polishing of Different Materials 78
• Polishing Rate 78
• Waste Disposal 79
• LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT 79
• CMP Slurry Containing Abrasive Particles with Photocatalytic Activity 79
• Additive for Improved Selectivity of CMP Slurry 80
• Slurry Containing Cerium Oxide for High-Speed Polishing 80
• Polishing Slurry Causing Reduced Dishing 81
• CURRENT MARKET STATUS 82
• Current Market Summary 82
• TABLE 33 CMP SLURRIES: GLOBAL REVENUES, THROUGH 2008 ($ MILLIONS) 83
• FIGURE 21 CMP SLURRIES: GLOBAL REVENUES, 2003-2008 ($ MILLIONS) 83
• Revenues by Material Type 83
• TABLE 34 CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE, 2008 ($ MILLIONS/%) 84
• FIGURE 22 CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE, 2008 (%) 85
• TABLE 35 DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008 ($ MILLIONS/%) 85
• FIGURE 23 DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE, 2008 (%) 86
• TABLE 36 METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008 ($ MILLIONS/%) 87
• FIGURE 24 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2008 (%) 87
• Revenues by Application 88
• TABLE 37 CMP SLURRIES: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS/%) 88
• FIGURE 25 CMP SLURRIES: MARKET SHARE BY APPLICATION, 2008 (%) 89
• Revenues by Region 89
• TABLE 38 CMP SLURRIES: REVENUES BY REGION, THROUGH 2008 ($MILLIONS) 90
• FIGURE 26 CMP SLURRIES: MARKET SHARE BY REGION, 2008 (%) 90
• MARKET GROWTH TRENDS 91
• Technological Trends 91
• PROJECTED MARKET FOR CMP SLURRIES 92
• Key Observations 92
• TABLE 39 FACTORS AFFECTING SALES OF CMP SLURRIES, THROUGH 2013 92
• Market Forecast for CMP Slurries 93
• Revenues by Application 93
• TABLE 40 FORECAST - CMP SLURRIES: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION) 94
• FIGURE 27 FORECAST - CMP SLURRIES: MARKET SHARE BY APPLICATION, 2013 (%) 94
• FIGURE 27 (CONTINUED) 95
• Revenues by Material Type 95
• TABLE 41 FORECAST - CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE, THROUGH 2013 ($ MILLIONS) 95
• FIGURE 28 FORECAST - CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE, 2013 (%) 96
• TABLE 42 FORECAST - DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS) 97
• FIGURE 29 FORECAST - DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE, 2013 (%) 97
• TABLE 43 FORECAST - METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS) 98
• FIGURE 30 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2013 (%) 99
• Revenues by Region 99
• TABLE 44 FORECAST - CMP SLURRIES: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS) 100
• FIGURE 31 FORECAST - CMP SLURRIES: MARKET SHARE BY REGION, 2013 (%) 100
• FIGURE 31 (CONTINUED) 101
• OTHER CMP CONSUMABLES 101
• TECHNOLOGY 101
• Pads 101
• Designs and Materials 101
• Shapes 102
• Pad Conditioners 103
• Filters 103
• Chemicals 103
• CURRENT TECHNICAL ISSUES 104
• High-polishing Rate and Uniform Planarization 104
• Reducing Downtime for Pad Conditioning 104
• Post-CMP Cleaning in the Copper Damascene Process 105
• Specialized Cleaning Methods 105
• LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT 105
• Enhanced Pad Conditioner 105
• Transparent Microporous CMP Pad 106
• Elastomer-modified CMP Pad 106
• Post-CMP Cleaning Solution for Thin Film Magnetic Heads Wafer Fabrication 107
• CURRENT MARKET STATUS 108
• Current Market Summary 108
• Revenues by Product Type 108
• TABLE 45 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY TYPE, THROUGH 2008 ($ MILLIONS) 109
• FIGURE 32 OTHER CMP CONSUMABLES: GLOBAL REVENUES, 2003-2008 ($ MILLIONS) 109
• FIGURE 33 OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE, 2008 (%) 110
• Revenues by Application 110
• TABLE 46 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS) 111
• FIGURE 34 OTHER CMP CONSUMABLES: MARKET SHARE BY APPLICATION, 2008 (%) 111
• Revenues by Region 111
• TABLE 47 OTHER CMP CONSUMABLES: REVENUES BY REGION, THROUGH 2008 ($MILLIONS) 112
• FIGURE 35 OTHER CMP CONSUMABLES: MARKET SHARE BY REGION, 2008 (%) 113
• MARKET GROWTH TRENDS 113
• Technological Trends 113
• PROJECTED MARKET FOR CMP PADS AND OTHER CONSUMABLES 114
• Key Observations 114
• TABLE 48 FACTORS AFFECTING SALES OF CMP PADS AND OTHER CONSUMABLE, THROUGH 2013 114
• Market Forecast for CMP Pads and Other Consumables 115
• Revenues by Product Type 115
• TABLE 49 FORECAST - OTHER CMP CONSUMABLES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS) 116
• FIGURE 36 FORECAST - OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE, 2013 (%) 116
• Revenues by Application 117
• TABLE 50 FORECAST - OTHER CMP CONSUMABLES: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION) 117
• FIGURE 37 FORECAST - OTHER CMP CONSUMABLES: MARKET SHARE BY APPLICATION, 2013 (%) 118
• Revenues by Region 118
• TABLE 51 FORECAST - OTHER CMP CONSUMABLES: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS) 119
• FIGURE 38 FORECAST - OTHER CMP CONSUMABLES: MARKET SHARE BY REGION, 2013 (%) 119
• FIGURE 38 (CONTINUED) 120

Chapter 4: GLOBAL INDUSTRY STRUCTURE 39

• ANALYSIS OUTLINE 28
• GLOBAL MARKET SUMMARY 28
• MARKET SEGMENTATION BY PRODUCT CATEGORY 28
• Market Segmentation by ........(Continued) 29
• TABLE 6 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES BY PRODUCT CATEGORY, THROUGH 2013 ($MILLIONS) 30
• FIGURE 2 CHEMICAL MECHANICAL POLISHING: GLOBAL MARKET BY PRODUCT CATEGORY, 2006-2013 ($MILLIONS) 31
• FIGURE 3 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY PRODUCT CATEGORY, 2008 AND 2013 (%) 31
• FIGURE 3 (CONTINUED) 32
• MARKET SEGMENTATION BY APPLICATION 32
• TABLE 7 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($MILLIONS) 33
• FIGURE 4 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY APPLICATION, 2008 AND 2013 (%) 34
• MARKET SEGMENTATION BY REGION 35
• TABLE 8 CHEMICAL MECHANICAL POLISHING: REVENUES BY REGION, THROUGH 2013 ($MILLIONS) 35
• FIGURE 5 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY REGION, 2008 AND 2013 (%) 36
• CMP EQUIPMENT 37
• BASIC EQUIPMENT DESIGN 37
• TABLE 9 BASIC CHEMICAL MECHANICAL POLISHING PROCESS 37
• CURRENT TECHNICAL ISSUES 37
• Uniform Polishing Pressure 37
• Carrier Head Position 37
• Determination of Polishing Endpoint 38
• Higher Production Throughput 38
• On-line Inspection 38
• Uniform Polishing Rate 38
• Reduction of Polishing Defects 39
• LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT 39
• Electro-chemical Mechanical Polishing 39
• Apparatuses and Methods for In-situ Endpoint Detection 40
• Laser Interferometer Detector 40
• Combined Eddy Current Sensing and Optical Monitoring 41
• System for Endpoint Detection in Copper Damascene Process 41
• Polishing Equipment with Pad Drum 42
• Chemical Mechanical Polishing Equipment with Rotating Belt 42
• CMP Equipment with Electromagnetic Coil 43
• CURRENT MARKET STATUS 43
• Current Market Summary 43
• Revenues by Equipment Type 43
• TABLE 10 SEMICONDUCTORS: REVENUES BY REGION, THROUGH 2008 ($ BILLIONS) 44
• FIGURE 6 SEMICONDUCTORS: REVENUES BY REGION, 2003-2008 ($ BILLIONS) 44
• TABLE 11 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY TYPE, THROUGH 2008 ($ MILLIONS) 45
• FIGURE 7 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES, 2003-2008 ($ MILLIONS) 46
• FIGURE 8 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY TYPE, 2008 (%) 46
• The Post-CMP Equipment Market 47
• TABLE 12 POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS TYPE, 2008 47
• Revenues by Application 47
• TABLE 13 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS) 48
• FIGURE 9 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY APPLICATION, 2008 (%) 48
• Revenues by Region 48
• Revenues ........(Continued) 49
• TABLE 14 CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION, THROUGH 2008 ($MILLIONS) 50
• FIGURE 10 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY REGION, 2008 (%) 50
• MARKET GROWTH TRENDS 51
• Semiconductor Industry Growth 51
• TABLE 15 FORECAST - SEMICONDUCTORS: REVENUES BY REGION, THROUGH 2013 ($BILLIONS) 51
• FIGURE 11 FORECAST - SEMICONDUCTORS: MARKET GROWTH BY REGION, 2008 AND 2013 ($ BILLIONS) 52
• Industry Growth for Other Emerging Applications 52
• Data Storage Media 53
• TABLE 16 FORECAST - HARD DISK DRIVES: GLOBAL PRODUCTION BY TYPE, THROUGH 2013 (MILLION UNITS) 53
• FIGURE 12 FORECAST - HARD DISK DRIVES: PRODUCTION SHARE BY TYPE, 2013 (% UNITS) 54
• TABLE 17 FORECAST - HARD DISKS: GLOBAL PRODUCTION BY TYPE, THROUGH 2013 (MILLION UNITS) 55
• FIGURE 13 FORECAST - HARD DISKS: GLOBAL PRODUCTION BY TYPE, 2008 AND 2013 (MILLION UNITS) 55
• FIGURE 14 FORECAST - HARD DISKS: PRODUCTION SHARE BY TYPE, 2013 (% UNITS) 56
• Recording Heads 56
• Advanced Displays 57
• TABLE 18 FORECAST - FLAT PANEL DISPLAYS: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($BILLIONS) 57
• FIGURE 15 FORECAST - FLAT PANEL DISPLAYS: GLOBAL REVENUES BY TYPE, 2008 AND 2013 (MILLION UNITS) 58
• FIGURE 16 FORECAST - FLAT PANEL DISPLAYS: MARKET SHARE BY TYPE, 2013 (%) 58
• Optics 59
• TABLE 19 FORECAST - OPTICS: GLOBAL MARKET GROWTH, THROUGH 2013 ($ BILLIONS) 59
• Technological Trends 59
• Regional Trends 60
• PROJECTED MARKET FOR CMP AND POST-CMP EQUIPMENT 61
• Key Observations 61
• TABLE 20 FACTORS AFFECTING SALES OF CMP AND POST-CMP EQUIPMENT, THROUGH 2013 61
• Market Forecast for CMP and Post-CMP Equipment 62
• Revenues by Application 62
• TABLE 21 FORECAST - CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION) 63
• FIGURE 17 FORECAST - CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY APPLICATION, 2013 (%) 63
• Revenues by Equipment Type 64
• TABLE 22 FORECAST - CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS) 64
• FIGURE 18 FORECAST - CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY TYPE, 2013 (%) 65
• Post-CMP Equipment Revenues by Process Type 65
• TABLE 23 FORECAST - POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS TYPE, THROUGH 2013 ($ MILLIONS) 66
• FIGURE 19 FORECAST - POST-CMP EQUIPMENT: MARKET SHARE BY PROCESS TYPE, 2013 (%) 66
• Revenues by Region 67
• TABLE 24 FORECAST - CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS) 67
• FIGURE 20 FORECAST - CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY REGION, 2013 (%) 68
• CMP SLURRIES 68
• TECHNOLOGY 68
• Abrasive Component 68
• Fumed Metal Oxides 69
• Precipitated Powders 69
• Other Slurry Components 69
• Slurry Compositions 70
• TABLE 25 SLURRIES FOR CHEMICAL-MECHANICAL POLISHING 71
• Oxide Slurry 72
• TABLE 26 SAMSUNG ELECTRONICS - OXIDE CMP SLURRY COMPOSITION 72
• Low-K Dielectric Slurry 73
• TABLE 27 CABOT MICROELECTRONICS - LOW-K DIELECTRIC CMP SLURRY COMPOSITION 73
• Polycrystalline Silicon Slurry 74
• TABLE 28 CHEIL INDUSTRIES - POLYCRYSTALLINE SILICON CMP SLURRY COMPOSITION 74
• Copper Slurry 74
• TABLE 29 MOTOROLA - COPPER CMP SLURRY COMPOSITION 75
• TABLE 30 CABOT MICROELECTRONICS - COPPER CMP SLURRY COMPOSITION 76
• TABLE 31 ROHM AND HAAS - COPPER CMP SLURRY COMPOSITION 77
• Tungsten Slurry 77
• TABLE 32 DUPONT AIR PRODUCTS - TUNGSTEN CMP SLURRY COMPOSITION 77
• CURRENT TECHNICAL ISSUES 77
• Minimization of Polishing Defects 78
• Polishing of Different Materials 78
• Polishing Rate 78
• Waste Disposal 79
• LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT 79
• CMP Slurry Containing Abrasive Particles with Photocatalytic Activity 79
• Additive for Improved Selectivity of CMP Slurry 80
• Slurry Containing Cerium Oxide for High-Speed Polishing 80
• Polishing Slurry Causing Reduced Dishing 81
• CURRENT MARKET STATUS 82
• Current Market Summary 82
• TABLE 33 CMP SLURRIES: GLOBAL REVENUES, THROUGH 2008 ($ MILLIONS) 83
• FIGURE 21 CMP SLURRIES: GLOBAL REVENUES, 2003-2008 ($ MILLIONS) 83
• Revenues by Material Type 83
• TABLE 34 CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE, 2008 ($ MILLIONS/%) 84
• FIGURE 22 CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE, 2008 (%) 85
• TABLE 35 DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008 ($ MILLIONS/%) 85
• FIGURE 23 DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE, 2008 (%) 86
• TABLE 36 METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008 ($ MILLIONS/%) 87
• FIGURE 24 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2008 (%) 87
• Revenues by Application 88
• TABLE 37 CMP SLURRIES: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS/%) 88
• FIGURE 25 CMP SLURRIES: MARKET SHARE BY APPLICATION, 2008 (%) 89
• Revenues by Region 89
• TABLE 38 CMP SLURRIES: REVENUES BY REGION, THROUGH 2008 ($MILLIONS) 90
• FIGURE 26 CMP SLURRIES: MARKET SHARE BY REGION, 2008 (%) 90
• MARKET GROWTH TRENDS 91
• Technological Trends 91
• PROJECTED MARKET FOR CMP SLURRIES 92
• Key Observations 92
• TABLE 39 FACTORS AFFECTING SALES OF CMP SLURRIES, THROUGH 2013 92
• Market Forecast for CMP Slurries 93
• Revenues by Application 93
• TABLE 40 FORECAST - CMP SLURRIES: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION) 94
• FIGURE 27 FORECAST - CMP SLURRIES: MARKET SHARE BY APPLICATION, 2013 (%) 94
• FIGURE 27 (CONTINUED) 95
• Revenues by Material Type 95
• TABLE 41 FORECAST - CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE, THROUGH 2013 ($ MILLIONS) 95
• FIGURE 28 FORECAST - CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE, 2013 (%) 96
• TABLE 42 FORECAST - DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS) 97
• FIGURE 29 FORECAST - DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE, 2013 (%) 97
• TABLE 43 FORECAST - METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS) 98
• FIGURE 30 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2013 (%) 99
• Revenues by Region 99
• TABLE 44 FORECAST - CMP SLURRIES: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS) 100
• FIGURE 31 FORECAST - CMP SLURRIES: MARKET SHARE BY REGION, 2013 (%) 100
• FIGURE 31 (CONTINUED) 101
• OTHER CMP CONSUMABLES 101
• TECHNOLOGY 101
• Pads 101
• Designs and Materials 101
• Shapes 102
• Pad Conditioners 103
• Filters 103
• Chemicals 103
• CURRENT TECHNICAL ISSUES 104
• High-polishing Rate and Uniform Planarization 104
• Reducing Downtime for Pad Conditioning 104
• Post-CMP Cleaning in the Copper Damascene Process 105
• Specialized Cleaning Methods 105
• LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT 105
• Enhanced Pad Conditioner 105
• Transparent Microporous CMP Pad 106
• Elastomer-modified CMP Pad 106
• Post-CMP Cleaning Solution for Thin Film Magnetic Heads Wafer Fabrication 107
• CURRENT MARKET STATUS 108
• Current Market Summary 108
• Revenues by Product Type 108
• TABLE 45 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY TYPE, THROUGH 2008 ($ MILLIONS) 109
• FIGURE 32 OTHER CMP CONSUMABLES: GLOBAL REVENUES, 2003-2008 ($ MILLIONS) 109
• FIGURE 33 OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE, 2008 (%) 110
• Revenues by Application 110
• TABLE 46 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS) 111
• FIGURE 34 OTHER CMP CONSUMABLES: MARKET SHARE BY APPLICATION, 2008 (%) 111
• Revenues by Region 111
• TABLE 47 OTHER CMP CONSUMABLES: REVENUES BY REGION, THROUGH 2008 ($MILLIONS) 112
• FIGURE 35 OTHER CMP CONSUMABLES: MARKET SHARE BY REGION, 2008 (%) 113
• MARKET GROWTH TRENDS 113
• Technological Trends 113
• PROJECTED MARKET FOR CMP PADS AND OTHER CONSUMABLES 114
• Key Observations 114
• TABLE 48 FACTORS AFFECTING SALES OF CMP PADS AND OTHER CONSUMABLE, THROUGH 2013 114
• Market Forecast for CMP Pads and Other Consumables 115
• Revenues by Product Type 115
• TABLE 49 FORECAST - OTHER CMP CONSUMABLES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS) 116
• FIGURE 36 FORECAST - OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE, 2013 (%) 116
• Revenues by Application 117
• TABLE 50 FORECAST - OTHER CMP CONSUMABLES: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION) 117
• FIGURE 37 FORECAST - OTHER CMP CONSUMABLES: MARKET SHARE BY APPLICATION, 2013 (%) 118
• Revenues by Region 118
• TABLE 51 FORECAST - OTHER CMP CONSUMABLES: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS) 119
• FIGURE 38 FORECAST - OTHER CMP CONSUMABLES: MARKET SHARE BY REGION, 2013 (%) 119
• FIGURE 38 (CONTINUED) 120

Chapter 5: INDUSTRY COMPETITIVENESS 25

• CHEMICAL MECHANICAL POLISHING DEVELOPMENT ACTIVITIES 160
• TABLE 63 RESEARCH ORGANIZATIONS INVOLVED IN CHEMICAL MECHANICAL POLISHING, WORLDWIDE 160
• TABLE 63 (CONTINUED) 161
• TABLE 63 (CONTINUED) 162
• TABLE 63 (CONTINUED) 163
• TABLE 63 (CONTINUED) 164
• TABLE 63 (CONTINUED) 165
• UNITED STATES 165
• Clarkson University 165
• TABLE 64 CLARKSON UNIVERSITY RESEARCH 166
• Massachusetts Institute of Technology 166
• TABLE 65 MIT RESEARCH 167
• National Institute of Standards and Technologies 167
• TABLE 66 NIST RESEARCH 168
• Rensselaer Polytechnic Institute 168
• TABLE 67 RENSSELAER POLYTECHNIC INSTITUTE RESEARCH 169
• University of Florida at Gainesville 169
• TABLE 68 UNIVERSITY OF FLORIDA RESEARCH 170
• EUROPE 171
• Interuniversitair Microelektronica Centrum, Belgium 171
• TABLE 69 IMEC CMP RESEARCH 171
• University of Twente, The Netherlands 172
• TABLE 70 UNIVERSITY OF TWENTE RESEARCH 172
• ASIA PACIFIC 172
• Hanyang University, South Korea 172
• TABLE 71 HANYANG UNIVERSITY RESEARCH 173
• Kyushu University, Japan 173
• TABLE 72 KYUSHU UNIVERSITY RESEARCH 174
• Nanyang Technological University, Singapore 174
• TABLE 73 NTU RESEARCH 175
• SUMMARY OF GLOBAL R&D ACTIVITIES IN CMP TECHNOLOGY 175
• FIGURE 44 CURRENT GLOBAL RESEARCH AND DEVELOPMENT BY SUBJECT (%) 176
• FIGURE 44 (CONTINUED) 177
• Industry Initiatives 177
• TABLE 74 PRIVATE ORGANIZATIONS INVOLVED IN CMP RESEARCH 177
• TABLE 74 (CONTINUED) 178
• OTHER CONSIDERATIONS 178
• COST FACTOR 178
• Equipment Cost 178
• Materials Cost 179
• QUALITY FACTOR 179
• TECHNOLOGY FACTOR 180
• MANUFACTURING CAPABILITY 180
• KEY GROWTH MARKETS 181
• TABLE 75 GLOBAL GROWTH FORECAST FOR CURRENT AND POTENTIAL CMP APPLICATIONS, 2008-2013 182
• MARKET GROWTH FACTORS 183
• DRIVING FORCES 183
• IMPACT OF MARKET GROWTH FACTORS 184
• TABLE 76 PERCENTAGE IMPACT OF MAJOR COMPETITIVE FACTORS ON THE GROWTH OF THE CMP MARKET, 2008-2013 184

Chapter 6: U.S. PATENT ANALYSIS

• INTRODUCTION 185
• SUMMARY OF PATENTS AWARDED DURING THE PERIOD 2006 THROUGH 2008 185
• TABLE 77 CHEMICAL MECHANICAL POLISHING - U.S. PATENTS, 2008 186
• TABLE 77 (CONTINUED) 187
• TABLE 77 (CONTINUED) 188
• TABLE 77 (CONTINUED) 189
• TABLE 77 (CONTINUED) 190
• TABLE 77 (CONTINUED) 191
• TABLE 77 (CONTINUED) 192
• TABLE 77 (CONTINUED) 193
• TABLE 77 (CONTINUED) 194
• TABLE 78 CHEMICAL MECHANICAL POLISHING - U.S. PATENTS, 2007 194
• TABLE 78 (CONTINUED) 195
• TABLE 78 (CONTINUED) 196
• TABLE 78 (CONTINUED) 197
• TABLE 78 (CONTINUED) 198
• TABLE 78 (CONTINUED) 199
• TABLE 78 (CONTINUED) 200
• TABLE 78 (CONTINUED) 201
• TABLE 78 (CONTINUED) 202
• TABLE 78 (CONTINUED) 203
• TABLE 78 (CONTINUED) 204
• TABLE 78 (CONTINUED) 205
• TABLE 78 (CONTINUED) 206
• TABLE 78 (CONTINUED) 207
• TABLE 78 (CONTINUED) 208
• TABLE 78 (CONTINUED) 209
• TABLE 79 CHEMICAL MECHANICAL POLISHING - U.S. PATENTS, 2006 210
• TABLE 79 (CONTINUED) 211
• TABLE 79 (CONTINUED) 212
• TABLE 79 (CONTINUED) 213
• TABLE 79 (CONTINUED) 214
• TABLE 79 (CONTINUED) 215
• TABLE 79 (CONTINUED) 216
• TABLE 79 (CONTINUED) 217
• TABLE 79 (CONTINUED) 218
• TABLE 79 (CONTINUED) 219
• TABLE 79 (CONTINUED) 220
• TABLE 79 (CONTINUED) 221
• TABLE 79 (CONTINUED) 222
• TABLE 79 (CONTINUED) 223
• TABLE 79 (CONTINUED) 224
• TABLE 79 (CONTINUED) 225
• TABLE 79 (CONTINUED) 226
• TABLE 79 (CONTINUED) 227
• TABLE 79 (CONTINUED) 228
• TABLE 79 (CONTINUED) 229
• TABLE 79 (CONTINUED) 230
• TABLE 79 (CONTINUED) 231
• GENERAL TRENDS 231
• TABLE 80 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT TRENDS, 2006-2008 232
• FIGURE 45 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT TRENDS, 2006-2008 (NUMBER OF PATENTS) 232
• TRENDS BY COUNTRY AND REGION 232
• FIGURE 46 SHARES OF GLOBAL PATENTS RELATED TO CHEMICAL MECHANICAL POLISHING BY REGION, 2006-2008 (%) 233
• FIGURE 47 CHEMICAL MECHANICAL POLISHING: PATENTS BY COUNTRY, 2006-2008 (%) 234
• FIGURE 47 (CONTINUED) 235
• TRENDS BY ASSIGNEE 235
• TABLE 81 ASSIGNEES OF U.S. PATENTS RELATED TO CHEMICAL MECHANICAL POLISHING, 2006-2008 236
• TABLE 81 (CONTINUED) 237
• TABLE 81 (CONTINUED) 238
• TABLE 81 (CONTINUED) 239
• TABLE 81 (CONTINUED) 240
• TRENDS BY PATENT CATEGORY 240
• FIGURE 48 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY CATEGORY, 2006-2008 (%) 241
• TRENDS BY APPLICATION 241
• FIGURE 49 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY APPLICATION, 2006-2008 (%) 242
• TRENDS BY MATERIAL TYPE 243
• FIGURE 50 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY MATERIAL TYPE, 2006- 2008 (%) 243
• FIGURE 50 (CONTINUED) 244

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