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Market Research Report

Semiconductor Material Analysis 2009: CMP Slurry & Pad

Published by DisplayBank
Published May, 2009 Product code 95290
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Price
US $ 5500 PDF By E-mail


Semiconductor Material Analysis 2009: CMP Slurry & Pad published by DisplayBank in May, 2009. This report price starts from US $ 5500.

Introduction

Abstract

Displaybank has prepared research report in Semiconductor industry.

First, we are planning to cover one of major element in semiconductor business, material sector, and especially chemical material related report. Followed from Series #1 “Semiconductor Chemical Material Analysis 2009: Wet Chemical”, we have just published “Semiconductor Chemical Material Analysis 2009: CMP Slurry & Pad“.

*The report categories basic (some chapters categorizes differently) Slurry based on the Use (Polishing Target)

Table of Contents

Chapter 1. Chemical Mechanical Planarization

  • 1. Introduction
  • 2. Semiconductor Manufacturing Process
  • 3. Planarization
    • 3-1. Planarization
    • 3-2. Traditional Planarization
  • 4. CMP (Chemical Mechanical Planarization)
    • 4-1. CMP (Chemical Mechanical Planarization)
    • 4-2. Multilayer Metallization with CMP
    • 4-3. Multilayer Metallization with Non-planarized and Planarized Surfaces
    • 4-4. Advantage & Disadvantage
    • 4-5. CMP Mechanism
    • 4-6. Application of CMP
  • 5. CMP Pad
  • 6. CMP Slurry

Chapter 2. Major Semiconductor Maker

  • 1. Semiconductor Maker
    • 1-1. Semiconductor Maker by Region
    • 1-2. Semiconductor by Product Category
  • 2. Major Semiconductor Maker(25#)
    • 2-1. Intel, Samsung, Texas Instruments, Toshiba
    • 2-2. STMicroelectronics, TSMC, Hynix, Renesas, SONY
    • 2-3. NXP, AMD, Infineon, NEC, Freescale , Micron Technology, Fujitsu
    • 2-4. IBM, Elpida Memory, Panasonic, UMC, Sharp, Spansion, Powerchip etc.

Chapter 3. Worldwide CMP Slurry & Pad Market Trend

  • 1. Worldwide Market Trend: 2008~2011
    • 1-1. CMP Pad
    • 1-2. ILD Slurry
    • 1-3. W Slurry
    • 1-4. Cu Slurry
    • 1-5. Al Slurry
    • 1-6. STI Slurry
    • 1-7. Poly-Si Slurry
    • 1-8. CMP Slurry: Overall
  • 2. Market Trend by Region: 2008~2011
    • 2-1. CMP Pad
    • 2-2. ILD Slurry
    • 2-3. W Slurry
    • 2-4. Cu Slurry
    • 2-5. Al Slurry
    • 2-6. STI Slurry
    • 2-7. Poly-Si Slurry

Chapter 4. Market Trend in Korea

  • 1. Fab Status
    • 1-1. Samsung: Product, Capa, Wafer Size, Input Wafer Trend, Information
    • 1-2. Hynix & Others: Product, Capa, Wafer Size, Input Wafer Trend, Information
  • 2. Market Trend: ILD Slurry
    • 2-1. Market Trend by Line : Volume
    • 2-2. Market Trend by Line : Amount
    • 2-3. Supply Chain
  • 3. Market Trend: W Slurry
    • 3-1. Market Trend by Line : Volume
    • 3-2. Market Trend by Line : Amount
    • 3-3. Supply Chain
  • 4. Market Trend: Cu Slurry
    • 4-1. Market Trend by Line : Volume
    • 4-2. Market Trend by Line : Amount
  • 5. Market Trend: STI Slurry (Ceria Slurry)
    • 5-1. Market Trend by Line: Volume
    • 5-2. Market Trend by Line: Amount
    • 5-3. Supply Chain
  • 6. Market Trend: Poly-Si Slurry
    • 6-1. Market Trend by Line: Volume
    • 6-2. Market Trend by Line: Amount

Chapter 5. Market Analysis

  • 1. Market Analysis: ILD Slurry
    • 1-1. Market Forecast
    • 1-2. Price Trend
    • 1-3. Industry Analysis
  • 2. Market Analysis: Metal Slurry
    • 2-1. Market forecast
    • 2-2. Price Trend: W Slurry, Cu Slurry, Al Slurry
    • 2-3. Industry Analysis
    • 2-4. Cu Slurry Demand: Cu Process Line
  • 3. Market Analysis: Ceria Slurry
    • 3-1. Market Forecast
    • 3-2. Price Trend : Abrasive, Additive
    • 3-3. Industry Trend
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