Market Research Report
Thermal Scanning Probe Lithography: Continuing the Path to Semiconductor Miniaturization
|Published by||BCC Research||Product code||802156|
|Published||Content info||11 Pages
Delivery time: 1-2 business days
|Thermal Scanning Probe Lithography: Continuing the Path to Semiconductor Miniaturization|
|Published: March 1, 2019||Content info: 11 Pages||
The idea of massively parallel atomic probe arrays has been around for decades, but can the tip speed, durability and finished results be scaled commercially?
If so, advantages over electron beam methods, especially in semiconductor manufacture, may be worth the efforts – ambient versus vacuum atmosphere, 2D transistors quality improvements improving flow of electrons at the intersection of metal and the 2D substrate, easily image the 2D semiconductor and then pattern the electrodes where desired, lower operational costs, reduced power consumption, and so forth.