Atomic Layer Deposition: R&D Portfolio Assessment and Growth Opportunities

Table of Contents

1.0. Strategic Imperatives

• 1.1. Strategic Imperative 8™Factors Creating Pressure on Growth in the Atomic Layer Deposition Industry
• 1.2. Strategic Imperative 8™
• 1.3. Impact of the Top Three Strategic Imperatives on Adoption of Atomic Layer Deposition Technology
• 1.4. Growth Opportunities Fuel the Growth Pipeline Engine™

2.0. Growth Environment

• 2.1. Research Scope
• 2.2. Research Methodology
• 2.3. Research Methodology Explained

3.0. Deposition Techniques

• 3.1. Thin Film Deposition Categorization
• 3.2. Atomic Layer Deposition Technology Overview
• 3.3. Atomic Layer Deposition Is Mostly Preferred for High-volume Production of Thin Films
• 3.4. Atomic Layer Deposition Provides Superior Control When Compared With Other Techniques
• 3.5. Plasma-enhanced Laser Deposition Is One of the Most Cost-effective Deposition Techniques
• 3.6. Thermal Deposition Has Excellent Material Deposition Uniformity

4.0. Types of Reactors

• 4.1. Longer Pulse and Purge Can Be Achieved by Increasing the Reactor's Surface Area and Volume

5.0. Types of Material for Atomic Layer Deposition

• 5.1. Oxide Dielectric Is the Most Commonly Used Material for Atomic Layer Deposition
• 5.2. Increase in Focus on Material Research for Developing Thin-film Materials for the Semiconductor Industry
• 5.3. Alkyl Reactant Materials Use Water as Counter Reactants since They are Very Highly Reactive

6.0. Materials Grown by Atomic Layer Deposition

• 6.1. Titanium Dioxide Is the Most Commonly Grown Material in the Atomic Layer Deposition Process
• 6.2. Atomic Layer Deposition Can Be Used for Fabricating Multi-insulator Metal-Insulator-Metal Capacitors
• 6.3. Titanium Oxide-based Thin Films Are Used for Microfluidic Systems
• 6.4. Thin Films Fabricated with Zinc Sulfide Are Used for Photocatalysis

7.0. Technology Advantages, Disadvantages, and IP Analysis

• 7.1. Atomic Layer Deposition Is an Advantage With Sensitive Substrates
• 7.2. Energy Wastage and Nanoparticle Emissions Hinder Use
• 7.3. The Technology Has Been Witnessing Immense Impact in the Solar and Energy Industry
• 7.4. Patents With Respect to Deposition of 2D Metal Chalcogenide Films Are Witnessing an Increase

8.0. Companies to Action

• 8.1. Oxford Instrument, UK
• 8.2. SENTECH Instruments, Germany
• 8.3. Beneq, Finland
• 8.4. Tokyo Electron Limited, Japan
• 8.5. Veeco Instruments, United States

9.0. Growth Opportunities

• 9.1. Growth Opportunity 1: The Semiconductor Industry
• 9.1. Growth Opportunity 1: The Semiconductor Industry (continued)
• 9.2. Growth Opportunity 2: The Nanofabrication Industry
• 9.2. Growth Opportunity 2: The Nanofabrication Industry (continued)
• 9.3. Growth Opportunity 3: The Energy Industry
• 9.3. Growth Opportunity 3: The Energy Industry (continued)
• 9.4. Growth Opportunity 4: The Biomedical Industry
• 9.4. Growth Opportunity 4: The Biomedical Industry (continued)
• 9.5. Growth Opportunity 5: The Electronics Industry
• 9.5. Growth Opportunity 5: The Electronics Industry (continued)

10.0. Contacts

• 10.1. Contacts

11.0. Next Steps

• 11.1. Your Next Steps
• 11.2. Why Frost, Why Now?

• Legal Disclaimer