Market Research Report
Global Photoresist and Photoresist Ancillaries Market 2017-2021
|Published by||TechNavio (Infiniti Research Ltd.)||Product code||541306|
|Published||Content info||107 Pages
Delivery time: 1-2 business days
|Global Photoresist and Photoresist Ancillaries Market 2017-2021|
|Published: August 9, 2017||Content info: 107 Pages||
Photoresists are light-sensitive materials that undergo changes in their physical form when subjected to radiation. Photoresist ancillaries are associated materials that are used during lithography. The photoresist grades considered in the report are ArF immersion, g- and i-line, ArF dry, and KrF. The photoresist ancillaries considered in the report include anti-reflective coatings, photoresist strippers, developers, and edge bead removers.
Technavio's analysts forecast the global photoresist and photoresist ancillaries market to grow at a CAGR of 5.98% during the period 2017-2021.
The report covers the present scenario and the growth prospects of the global photoresist and photoresist ancillaries market for 2017-2021. To calculate the market size, the report considers the sales of ArF immersion, ArF dry, KrF and g- and i-line. Photoresist ancillaries include the sales of anti-reflective coatings, developers, edge bead removers, and photoresist strippers.
The market is divided into the following segments based on geography:
Technavio's report, Global Photoresist and Photoresist Ancillaries Market 2017-2021, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.
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