Market Research Report
Photoresists and Photoresist Ancillaries Market for Semiconductors & Integrated Circuits, Printed Circuit Boards and Other Applications - Global Industry Analysis, Size, Share, Growth, Trends and Forecast, 2014 - 2020
|Published by||Transparency Market Research||Product code||320989|
|Published||Content info||83 Pages
Delivery time: 1-2 business days
|Photoresists and Photoresist Ancillaries Market for Semiconductors & Integrated Circuits, Printed Circuit Boards and Other Applications - Global Industry Analysis, Size, Share, Growth, Trends and Forecast, 2014 - 2020|
|Published: November 28, 2014||Content info: 83 Pages||
Title: Photoresists (g-line and i-line, KrF, ArF Dry, ArF Immersion) and Photoresist Ancillaries (Anti-reflective Coatings, Photoresist Developers, Edge Bead Removers and Others) Market for Semiconductors & Integrated Circuits, Printed Circuit Boards and Other Applications - Global Industry Analysis, Size, Share, Growth, Trends and Forecast, 2014 - 2020.
Photoresists are light-sensitive materials that are primarily used in fabrication and packaging of semiconductors, integrated circuits, flat panel displays and printed circuit boards. Photoresists play an important role in photolithography and photo-patterning process. Photoresists consist of resin or polymer, solvent and photo-sensitizer. These are segmented into positive and negative photoresists based on developing option. Photoresists are applied on the surface of a wafer and further exposed to light of pre-determined wavelength. Photoresist ancillaries are supporting materials that are used to improve the efficiency and resolution of the photolithography process. These are used right from the start of the process such as adhesion promotion of photoresists to wafer substrate in order to develop photoresists to remove excessive photoresists after the developer treatment.
Growth in semiconductor industry and dynamic flat panel display technology trends are expected to be the major driving factors for growth of the photoresists and photoresist ancillaries market. However, environmental and occupational health hazards associated with photoresists and photoresist ancillaries component is expected to hamper market growth. The upcoming nanoelectromechanical systems (NEMS) are anticipated to provide opportunities for players in the market.
This report provides detailed analysis and forecast of the photoresists and photoresist ancillaries market on a global and regional level from 2014 to 2020. On the global level, the market has been segmented based on revenue (US$ Mn) from 2014 to 2020. In order to provide in-depth understanding of the market at the regional level, demand has been forecast in terms of revenue (US$ Mn) from 2014 to 2020. The report includes drivers and restraints, and their impact on the growth of the market during the forecast period. The study also encompasses opportunities for market growth at the global level.
The report includes a thorough analysis of the value chain in order to provide detailed understanding of the market. It comprises of a Porter's Five Forces model, which provides an insight into the intensity of competition in the market. Furthermore, the study includes market attractiveness analysis, where various end-users are benchmarked based on market size, growth rate and general attractiveness. The market has been segmented based on product segments and applications. Product segments of photoresists market include g-line and i-line, KrF, ArF dry and ArF immersion. Global photoresists ancillaries market has been segmented as antireflective coatings, photoresists developer, edge bead remover and others. Each segment has been analyzed and forecast based on revenue (USD million) from 2014 to 2020. Additionally, the segments have been analyzed and forecast based on current trends at the global and regional level during the given time period. Regionally, the market has been segmented into North America, Europe, Asia Pacific and Rest of the World (RoW). Market has been analyzed based on demand and forecast trends are based on current trends for the period of six years.
Secondary research sources that were typically referred to include, but were not limited to company websites, annual reports, financial reports, broker reports, investor presentations, and SEC filings. Other sources such as internal and external proprietary databases, relevant patent and regulatory databases, national government documents, statistical databases and market reports, news articles, press releases, and webcasts specific to companies operating in the market have also been referred for the report.
We conducted primary interviews with industry participants and commentators in order to validate data and analysis. A typical research interview fulfilled functions such as providing first-hand information on market size, market trends, growth trends, competitive landscape and outlook. This helped in validating and strengthening the secondary research findings. Primary research further developed the analysis team's expertise and market understanding.
Profiles of leading companies have been provided in the report along with detailed analysis of their market share. The study features profiles of companies such as JSR Corporation, The Dow Chemical Company, Tokyo Ohka Kogyo Co., Ltd., Avantor Performance Materials Inc., Merck KGaA, FUJIFILM Electronic Materials Co. Ltd., E. I. du Pont de Nemours and Company, Shin-Etsu Chemical Co., Ltd., Sumitomo Chemical Co., Ltd. and LG Chem Ltd.
This report segments the global photoresists and photoresist ancillaries market as follows: