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994597

High-k and ALD/CVD Metal Precursors

Published: | Global Industry Analysts, Inc. | 126 Pages | Delivery time: 1-2 business days

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High-k and ALD/CVD Metal Precursors
Published: June 1, 2021
Global Industry Analysts, Inc.
Content info: 126 Pages
Delivery time: 1-2 business days
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  • Table of Contents
Description

Global High-k and ALD/CVD Metal Precursors Market to Reach $705.6 Million by 2026

A sub-set of CVD, Atomic layer deposition (AVD) is a process that enables atomic level control as well as deposition to be achieved. The ALD technique involves feeding of different cursors alternatingly, into a reaction chamber, one after the other, where they undergo different self-limiting surface reactions. In each of those reaction cycles, same quantity of material is deposited which leads to alternating layers of those different materials. The layers are smooth, highly dense and have uniform thickness. ALD represents a method for depositing thin films of multi-components, by way of co-injecting precursors like Si and Hf, so that a single, homogenous layered film is formed. This is used in many applications including 3D NAND, FinFET and self-aligned patterning among others. With ALD, it is possible to create dielectric and metal films as per the requirements of precursor. It is a technique of thin-film deposition based on sequential application of CVD process with two chemicals. These chemicals are called reactants or precursors. They react with material surface in a self-limiting, sequential manner, one after the other. ALD is considered an important process for fabrication of semiconductor devices for nanomaterials synthesis. The materials possess very high dielectric values capable of rapidly storing and accessing data. Another important benefit with the technique is that it offers exceptional deposition conformality, in high aspect ratio structures. Thickness control offered by the method is at Angstrom level. Thin films using high-? Dielectric materials like ZrO2, HfO2, Ta2O5 and Al2O3 can be produced using the technique for high-? Gate oxides, DRAM as well as nitrides for interconnects and electrodes. ALD/CVD processes are attractive mainly because they make possible growing of thin films which can be highly uniform and which conform to the given specifications.

Global High-k and ALD/CVD Metal Precursors market is projected to register healthy growth over the near-to-long term. The market, estimated at US$472.8 Million in 2020 is projected to reach US$705.6 Million by 2026, registering a compounded annual growth rate (CAGR) of 7.0% over the analysis period. Asia-Pacific represents the largest regional market for High-k and ALD/CVD Metal Precursors, accounting for an estimated 48.9% share of the global total in 2020. The market, estimated at US$231.3 Million in 2020 is projected to reach US$376.8 Million by the end of the analysis period. China is expected to spearhead growth and emerge as the fastest growing regional market with a CAGR of 8.7% over the analysis period. The market is expected to progress steadily to evolve as a major regional market for High-k and ALD/CVD Metal Precursors, supported by various factors conducive to healthy growth.

By Technology, Interconnect Segment to Reach $360.1 Million by 2026

Global market for Interconnect (Technology) segment is estimated at US$248.3 Million in 2020, and is projected to reach US$360.1 Million by 2026 reflecting a compounded annual growth rate of 6.5% over the analysis period. Asia-Pacific constitutes the largest regional market for Interconnect segment, accounting for 45.7% of the global sales in 2020. China is poised to register the fastest compounded annual growth rate of 8.1% over the analysis period, to reach US$67 Million by the end of the analysis period.

Select Competitors (Total 36 Featured) -

  • ADEKA Corporation
  • Air Liquide S.A.
  • Colnatec LLC
  • DuPont de Nemours, Inc.
  • Entegris, Inc.
  • Linde plc
  • Merck KGaA
  • Nanmat Technology Co., Ltd.
  • Strem Chemicals, Inc.
  • Tri Chemical Laboratories Inc.
  • UP Chemical Co., Ltd
Table of Contents
Product Code: MCP21969

TABLE OF CONTENTS

I. METHODOLOGY

II. EXECUTIVE SUMMARY

  • 1. MARKET OVERVIEW
    • Impact of COVID-19 Pandemic and Looming Global Recession
    • 2020 Marked as a Year of Disruption & Transformation
    • EXHIBIT 1: World Economic Growth Projections (Real GDP, Annual % Change) for 2020 through 2022
    • A Retrospective Review of Year 2020 that Left the World in Shambles & Industries and Markets Upended
    • EXHIBIT 2: Supply Chain Disruptions Impact Large Number of Electronic Manufacturers: % of Companies Impacted by Supply Chain Delays Due to COVID-19 Worldwide as of May 2020
    • Semiconductor Trends for Specific End-Use Categories
    • COVID-19 Pandemic Storm Warrants New Strategies to Help Semiconductor Leaders Secure New Lease of Life
    • Pandemic Disrupts High-κ and ALD CVD Metal Precursors Supply Chain
    • An Introduction to High-κ and ALD/CVD Metal Precursors
    • Types of ALD Precursors
    • Global Market Prospects & Outlook
    • Interconnects Segment Leads the Global Market
    • Asia-Pacific Continues to Spearhead Market Growth
    • Competition
    • Recent Market Activity
  • 2. FOCUS ON SELECT PLAYERS
  • 3. MARKET TRENDS & DRIVERS
    • Atomic Layer Deposition: Adding New Dimensions to Advanced Chip Designs
    • Advantages & Disadvantages of ALD
    • ALD for High-κ Layers to Improve Semiconductor Technologies
    • Microelectronics: Among the Leading Adopters of High-κ and ALD Metal Precursors
    • ALD Emerges as a Vital Process for Fabricating Microelectronics
    • Miniaturization of Electronic Devices Spells Opportunities
    • Focus on Harnessing Digital Transformation Bodes Well for Semiconductors, Presenting Opportunities for the Market
    • EXHIBIT 3: COVID-19 Has Created an Environment Where Digital Transformation Equals Survival: Global Digital Transformation Spending (In US$ Billion) for Years 2017 Through 2023
    • Growing Importance of High-κ Precursors in Modern Semiconductor Devices to Fuel Market Prospects
    • EXHIBIT 4: High-κ Dielectric Candidates and Relevant Properties
    • High-κ Precursors in Next-Generation Memory & Semiconductor Devices
    • Need for Faster Access and Storage of Data Drives Demand for High-κ Value Materials
    • High-κ Materials for Next Generation of DRAM Capacitors
    • Advancing ALD Technology Drives Demand for Thin-Film Materials in New Industrial Applications, Presenting Market Opportunities
    • EXHIBIT 5: Global Market for Industrial Semiconductors (In US$ Billion) for Years 2020, 2022 & 2024
    • Rising Demand for More Sophisticated Industrial PCs Widen the Prospects
    • Industry 4.0 & Smart Factory to Steer Future Expansion
    • EXHIBIT 6: Major Industry 4.0 Technologies: Global Market Size (US$ Billion) for Internet of Things (IoT), Big Data, Smart factory, Advanced Analytics, Service Robotics, and Smart Machines for 2020
    • Consumer Electronics: A Major End-Use Market for Semiconductor Devices Lends Traction to Market Growth
    • EXHIBIT 7: Smartphone Penetration Rate as Share of Total Population: 2016-2021
    • EXHIBIT 8: World Tablet PCs Market: Breakdown of Annual Volume Sales (in Million Units) for the Years 2013, 2018 & 2019
    • Thin Metallic Films Manufacturing: A Promising Area of Growth
    • Growing Role of ALD in Photovoltaic Devices to Boost Market Prospects
    • COVID-19 Outbreak Affects Solar PV Industry Operations
    • EXHIBIT 9: COVID-19 Impact on Solar Industry: Solar PV Capacity Additions (in GW) by Sector for 2019 and 2020
    • EXHIBIT 10: Solar PV Capacity Additions (in GW) by Sector for China, Europe, USA and India: 2019
    • Rising Importance of ALD in Energy Storage Applications to Spur Demand for Metal Precursors
    • Market Benefits from the Growing Use of Nanotechnologies in Semiconductors Industry
    • Role of High-κ and ALD/CVD Metal Precursors in VLSI Technology to Maintain Capacitor of Semiconductor Devices
    • Selection of Precursor in ALD/CVD: A Key Factor
    • Limitations of TiCl4 Precursors Drive Shift towards Metal-Organic Options for Thin-Film Deposition in Semiconductor & Non-Semiconductor Applications
    • Atomic Layer Deposition to Facilitate Metal Gate Stacking for CMOS
    • High-κ Dielectrics Display Variations in Leakage with Aspect Ratio
    • Non-Ideal ALD Processes: Primary Challenges & Mitigation Efforts
  • 4. GLOBAL MARKET PERSPECTIVE
    • TABLE 1: World Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
    • TABLE 2: World Historic Review for High-k and ALD/CVD Metal Precursors by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 3: World 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Geographic Region - Percentage Breakdown of Value Revenues for USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets for Years 2015, 2020 & 2027
    • TABLE 4: World Current & Future Analysis for Interconnect by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
    • TABLE 5: World Historic Review for Interconnect by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 6: World 12-Year Perspective for Interconnect by Geographic Region - Percentage Breakdown of Value Revenues for USA, Japan, China, Europe, Asia-Pacific and Rest of World for Years 2015, 2020 & 2027
    • TABLE 7: World Current & Future Analysis for Capacitor by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
    • TABLE 8: World Historic Review for Capacitor by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 9: World 12-Year Perspective for Capacitor by Geographic Region - Percentage Breakdown of Value Revenues for USA, Japan, China, Europe, Asia-Pacific and Rest of World for Years 2015, 2020 & 2027
    • TABLE 10: World Current & Future Analysis for Gates by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
    • TABLE 11: World Historic Review for Gates by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 12: World 12-Year Perspective for Gates by Geographic Region - Percentage Breakdown of Value Revenues for USA, Japan, China, Europe, Asia-Pacific and Rest of World for Years 2015, 2020 & 2027

III. MARKET ANALYSIS

  • UNITED STATES
    • TABLE 13: USA Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 14: USA Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 15: USA 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • JAPAN
    • TABLE 16: Japan Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 17: Japan Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 18: Japan 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • CHINA
    • TABLE 19: China Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 20: China Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 21: China 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • EUROPE
    • TABLE 22: Europe Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Geographic Region - France, Germany, Italy, UK and Rest of Europe Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
    • TABLE 23: Europe Historic Review for High-k and ALD/CVD Metal Precursors by Geographic Region - France, Germany, Italy, UK and Rest of Europe Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 24: Europe 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Geographic Region - Percentage Breakdown of Value Revenues for France, Germany, Italy, UK and Rest of Europe Markets for Years 2015, 2020 & 2027
    • TABLE 25: Europe Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 26: Europe Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 27: Europe 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • FRANCE
    • TABLE 28: France Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 29: France Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 30: France 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • GERMANY
    • TABLE 31: Germany Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 32: Germany Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 33: Germany 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • ITALY
    • TABLE 34: Italy Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 35: Italy Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 36: Italy 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • UNITED KINGDOM
    • TABLE 37: UK Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 38: UK Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 39: UK 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • REST OF EUROPE
    • TABLE 40: Rest of Europe Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 41: Rest of Europe Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 42: Rest of Europe 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • ASIA-PACIFIC
    • TABLE 43: Asia-Pacific Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Geographic Region - South Korea, Taiwan and Rest of Asia-Pacific Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
    • TABLE 44: Asia-Pacific Historic Review for High-k and ALD/CVD Metal Precursors by Geographic Region - South Korea, Taiwan and Rest of Asia-Pacific Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 45: Asia-Pacific 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Geographic Region - Percentage Breakdown of Value Revenues for South Korea, Taiwan and Rest of Asia-Pacific Markets for Years 2015, 2020 & 2027
    • TABLE 46: Asia-Pacific Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 47: Asia-Pacific Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 48: Asia-Pacific 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • SOUTH KOREA
    • TABLE 49: South Korea Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 50: South Korea Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 51: South Korea 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • TAIWAN
    • TABLE 52: Taiwan Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 53: Taiwan Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 54: Taiwan 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • REST OF ASIA-PACIFIC
    • TABLE 55: Rest of Asia-Pacific Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 56: Rest of Asia-Pacific Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 57: Rest of Asia-Pacific 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
  • REST OF WORLD
    • TABLE 58: Rest of World Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
    • TABLE 59: Rest of World Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
    • TABLE 60: Rest of World 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027

IV. COMPETITION

  • Total Companies Profiled: 36