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PUBLISHER: Knowledge Sourcing Intelligence | PRODUCT CODE: 1302931

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PUBLISHER: Knowledge Sourcing Intelligence | PRODUCT CODE: 1302931

Ion Beam Etching System Market - Forecasts from 2023 to 2028

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The ion beam etching system market is estimated to grow at a CAGR of 7.76% during the forecast period.

An ion beam etching system is a technological equipment used in the manufacturing process of semiconductors and other advanced materials that works by using a beam of ions to selectively remove material from a substrate and create precise patterns and structures. The ion beam etch technology is used in the production of microelectronics, optoelectronics, and other high-tech industries where precision and accuracy are critical as it offers high accuracy, control, and the ability to etch a wide range of materials, including metals, semiconductors, and insulators. The competitive advantage of ion beam etch systems to create complex structures and patterns over other methods, such as photolithography, is resulting in its widespread adoption in the production of high-performance electronic devices, including microprocessors, optical devices, power devices, memory chips, and sensors. The rising demand for versatile and precise technology to manufacture various advanced materials by companies, the growing adoption of semiconductor-based technology across various industries, and the increasing demand for electronic devices with improved performance is driving the demand for the ion beam etching system market.

Market Drivers:

Advancement of nanotechnology

The growing adoption of nanotechnology and the rapid advancement in the nanotechnology field, driven by the ongoing research projects conducted by various institutions and companies, is expanding the nanotechnology market. For instance, a research book named Nanocosmetics, published by a group of scientists in 2020, predicted that the global nanotechnology industry would grow and reach a market size larger than US$125 billion in 2024. In addition, a journal published by the Sichuan International Medical Exchange & Promotion Association in 2020 revealed that the international investment in nanotechnology reached approximately US$25 billion, with the share of the US and China amounting to US$2 billion individually. The rapid advancement in nanotechnology is driving the market as ion beam etching is a critical tool in nanotechnology used to create complex and precise structures on a wide range of materials due to its ability to etch materials with sub-nanometer precision required to produce the next generation of electronics, optics, and biotechnology devices. For instance, research conducted by Eindhoven University of Technology in 2021 revealed the advantages of using ion beam technology to fabricate plasmonic structures with features at the nanometric level.

By type, the batch-type ion beam etching system sector is expected to hold a major market share.

A batch-type ion beam etching system is designed to process multiple wafers simultaneously. It is extensively used in high-volume production environments where large quantities of wafers must be processed quickly and efficiently. Therefore, batch-type ion beam etching systems are consumed increasingly by semiconductor manufacturers and other industries that require high-volume production of advanced materials, which is expected to increase its share in the ion beam etching system market over the forecast period.

By application, the MEMs segment is projected to grow significantly over the forecast period.

The advancements in MEMs technology are enabling the creation of highly complex and sophisticated devices, such as microsensors and microactuators, in the healthcare, aerospace, and automotive industries. Further, MEMs devices are in high demand for automation and control applications such as manufacturing and robotics. Therefore, the growing demand for MEMs driven by the advancements in MEMs technology and the increasing demand for automation is expected to increase the application of ion beam etching systems in MEMs manufacturing processes since ion beam etching is a crucial process in MEMS manufacturing for the precise and accurate fabrication of miniature structures that integrate mechanical and electrical components onto a single chip.

The presence of substitute technologies and the ion beam etching system's complexity could limit the market's growth.

The complexity of the ion beam etching process is restricting the growth of the market as ion beam etching systems require a high level of expertise and specialized knowledge to operate effectively. The shortage of skilled operators is limiting the adoption of ion beam etch systems across certain industries since these systems require specialized equipment and expertise, resulting in additional manufacturing and maintenance expenses. Further, the emergence of alternative technologies such as plasma etching and reactive ion etching is straining the growth of the ion beam etching system market since these technologies offer similar capabilities to ion beam etching systems at a lower cost and lower complexity level, increasing their accessibility to a wider range of industries.

Product offerings

  • Infinity Ion Beam Etch Systems by Denton Vacuum LLC - Denton Vacuum LLC, a US-based company generating specialty products to be used in semiconductor processes, manufactures two ion beam etching systems, Infinity Load Lock Etch, and Infinity PSIBE systems to be used for processing wafers, generate patterned etches, and assess chip design in the optics, semiconductor, data storage, and MEMs manufacturing processes.
  • Ion beam etch systems by Veeco Instruments Inc. - Veeco Instruments Inc., a leading company producing different equipment for semiconductor processing, manufactures two different ion beam etch system products, Nexus IBE and Lancer ion beam etch system. Lancer ion beam systems are used in the electronics and automotive industry, whereas Nexus IBE is adopted across various applications due to their enhanced control and uniformity.
  • Ion beam etching system by Hitachi High-Tech Corporation - Hitachi High-Tech Corporation, a company specializing in the production of various manufacturing equipment, inspection, and analytical systems, produces ion beam etching systems of all three types, namely, compact, single wafer type, and batch type ion beam etching systems that facilitate micro-fabrication by using parallel and even beams.

Asia Pacific holds a major share of the ion beam etching systems market and is expected to grow robustly during the forecast period.

The expansion of the semiconductor sector fueled by technological advancements is fueling the growth of the region's ion beam wet etch systems market. For instance, the International Trade Administration revealed the growth in the Japanese semiconductor industry by reporting a 19.8% growth between 2020 and 2021, contributing to about 9% of the aggregate global semiconductor production. Additionally, in September 2022, the Indian government revealed its plan to invest more than INR 76,000 crores towards establishing a semiconductor and display manufacturing ecosystem within the country. In addition, the Indian government's Press Information Bureau predicted in 2022 that the country's semiconductor market would grow from US$15 billion in 2020 to US$63 billion by 2026. Further, according to data published by the World Semiconductor Trade, Taiwan's semiconductor industry generated sales revenues of TWD625.53 billion in the third quarter of 2022. In addition, the adoption of semiconductor-based technology is increasing across various industries, including automotive, aerospace, and healthcare, fueling the demand for ion beam etching systems to create precise patterns and structures required for producing greater quality semiconductors used in these industries.

Market Segmentation:

By Type

  • Compact ion beam etching machine
  • Single wafer type ion beam etching machine
  • Batch-type ion beam etching machine
  • Others

By Application

  • MEMS
  • Sensors
  • Power devices
  • High-frequency devices and optical devices
  • Others

By Geography

  • Americas
  • USA
  • Canada
  • Others
  • Europe Middle East and Africa
  • Germany
  • France
  • United Kingdom
  • Others
  • Asia Pacific
  • China
  • Japan
  • India
  • South Korea
  • Taiwan
  • Others
Product Code: KSI061615210



  • 1.1. Market Overview
  • 1.2. Market Definition
  • 1.3. Scope of the Study
  • 1.4. Market Segmentation
  • 1.5. Currency
  • 1.6. Assumptions
  • 1.7. Base, and Forecast Years Timeline


  • 2.1. Research Data
  • 2.2. Research Process


  • 3.1. Research Highlights


  • 4.1. Market Drivers
  • 4.2. Market Restraints
  • 4.3. Porter's Five Force Analysis
    • 4.3.1. Bargaining Power of Suppliers
    • 4.3.2. Bargaining Power of Buyers
    • 4.3.3. Threat of New Entrants
    • 4.3.4. Threat of Substitutes
    • 4.3.5. Competitive Rivalry in the Industry
  • 4.4. Industry Value Chain Analysis


  • 5.1. Introduction
  • 5.2. Compact ion beam etching machine
  • 5.3. Single wafer type ion beam etching machine
  • 5.4. Batch-type ion beam etching machine
  • 5.5. Others


  • 6.1. Introduction
  • 6.2. MEMS
  • 6.3. Sensors
  • 6.4. Power devices
  • 6.5. High-frequency devices and optical devices
  • 6.6. Others


  • 7.1. Introduction
  • 7.2. Americas
    • 7.2.1. USA
    • 7.2.2. Canada
    • 7.2.3. Others
  • 7.3. Europe Middle East And Africa
    • 7.3.1. Germany
    • 7.3.2. France
    • 7.3.3. United Kingdom
    • 7.3.4. Others
  • 7.4. Asia Pacific
    • 7.4.1. China
    • 7.4.2. Japan
    • 7.4.3. India
    • 7.4.4. South Korea
    • 7.4.5. Taiwan
    • 7.4.6. Others


  • 8.1. Major Players and Strategy Analysis
  • 8.2. Emerging Players and Market Lucrativeness
  • 8.3. Mergers, Acquisitions, Agreements, and Collaborations
  • 8.4. Vendor Competitiveness Matrix


  • 9.1. Veeco
  • 9.2. scia Systems GmbH
  • 9.3. Hitachi High-Tech Corporation
  • 9.4. Y.A.C. HOLDINGS CO., LTD.
  • 9.5. Oxford Instruments
  • 9.6. Hakuto Co., Ltd.
  • 9.7. Leica Microsystems
  • 9.8. Intlvac Thin Film Corporation
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Jeroen Van Heghe

Manager - EMEA



Christine Sirois

Manager - Americas


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