PUBLISHER: QYResearch | PRODUCT CODE: 1873410
PUBLISHER: QYResearch | PRODUCT CODE: 1873410
The global market for EUV Mask Defect Inspection Equipment was estimated to be worth US$ 1864 million in 2024 and is forecast to a readjusted size of US$ 3846 million by 2031 with a CAGR of 12.5% during the forecast period 2025-2031.
This report provides a comprehensive assessment of recent tariff adjustments and international strategic countermeasures on EUV Mask Defect Inspection Equipment cross-border industrial footprints, capital allocation patterns, regional economic interdependencies, and supply chain reconfigurations.
Mask, also known as Photomask or Reticle, is a graphic master used in the lithography process commonly used in microelectronics processing technology. As a carrier of graphic information, Mask transfers the graphic to the base material through the exposure process, thereby realizing the transfer of the graphic.
Mask defect detection is a key link in the semiconductor lithography process, which aims to check the Mask and identify and repair the defects on it. As a critical component in the lithography process, Mask is responsible for accurately transferring the circuit pattern to the wafer, and its quality is directly related to the accuracy of the wafer pattern and the performance of the final device. There are various types of defects, including particle contamination, pattern breakage, bridging problems, and defects in the mask material itself.
EUV Mask defect detection equipment is a special equipment that plays an important role in the high-end semiconductor process technology. Given the high precision required by EUV lithography technology, even the smallest defect on the Mask may significantly affect the quality of the circuit pattern on the wafer, and thus adversely affect the performance and yield of the chip. Therefore, the use of special detection equipment to strictly inspect the EUV Mask is an indispensable key link to ensure the quality of semiconductor manufacturing.
At present, optical detection is the mainstream in semiconductor detection technology. The types of semiconductor optical detection include pattern, non-pattern and mask detection. Among them, pattern defect detection is divided into bright field and dark field detection. Both are analyzed through optical signals. The difference is that the bright field is a vertically reflected light signal, while the dark field is a scattered light signal.
In the semiconductor lithography process, corresponding light sources need to be used for different masks. Different mask applications vary greatly, and can be generally divided into binary masks, phase-shift masks and EUV masks. EUV Mask is a new type of mask designed specifically for EUV (extreme ultraviolet) lithography technology. Given the extremely short wavelength of EUV and its easy absorption by a variety of materials, traditional refractive elements such as lenses cannot be used. Instead, according to the Bragg law, the reflection of the light beam is achieved through a multi-layer (ML) structure (unlike EUV, DUV uses transmitted light). This type of mask is widely used in 7nm, 5nm, 3nm and 2nm (TSMC plans to mass produce in 2025) high-end manufacturing processes.
At present, mask detection technology is mainly optical detection and SEM detection. Among them, the optical inspection companies are mainly Lasertec and KLA, while SEM inspection is Advantest. From the perspective of downstream applications, as long as the mask uses Pellicle, EUV Mask inspection equipment is required (in other words, as long as there is an EUV lithography machine, EUV inspection equipment must be used), but at present, not all EUV Masks of downstream terminal manufacturers will be used with Pellicle.
In DUV lithography or optical Mask technology, Pellicle plays a key role. The Mask inspection tool operates at an exposure wavelength of 193nm, and inspection is performed through this layer of film. For the wafer fab, this is a direct and efficient process. However, in extreme ultraviolet (EUV) lithography technology, the manufacturing process of the Mask needs to be carried out in a dedicated Mask workshop. At this point, the inspection of the Mask becomes more complicated because it requires a high-resolution system. In the wafer fab environment, the ideal situation is to use a layer of Pellicle to protect the Mask from particle contamination, while allowing the inspection system to work through this layer of Pellicle. If there are no defects, you can proceed; if defects are detected, you need to remove the pellicle and send the Mask to the Mask workshop for cleaning.
EUV Mask defect detection equipment is mainly used in Mask Shop and Fab. The Fab includes the mask production line and the wafer manufacturing production line. For the Fab, there are two main reasons for using EUV Mask defect detection equipment. First, once the pellicle is attached to the Mask, other types of equipment (such as electron beam or DUV equipment) except EUV detection equipment are difficult to achieve high-sensitivity detection effects. This is because the presence of pellicles interferes with the detection capabilities of these devices, making it difficult for them to accurately identify tiny defects. Secondly, EUV detection equipment has higher detection accuracy and can detect defects and particles that traditional DUV Mask detection methods cannot capture. Mask Shop has always had a relatively large share, reaching about 61% in 2023. However, with the acceleration of commercialization of smaller advanced process nodes, it is expected that the share of Fab will reach 42% by 2030.
At present, the EUV Mask defect detection equipment market is mainly monopolized by KLA and Lasertec. EUV Mask defect detection equipment is a high-precision and advanced equipment with a long delivery time. For example, Lasertec's delivery time is two years. In the next few years, the two leading companies will still maintain a monopoly in the EUV Mask defect detection market.
This report aims to provide a comprehensive presentation of the global market for EUV Mask Defect Inspection Equipment, focusing on the total sales volume, sales revenue, price, key companies market share and ranking, together with an analysis of EUV Mask Defect Inspection Equipment by region & country, by Type, and by Application.
The EUV Mask Defect Inspection Equipment market size, estimations, and forecasts are provided in terms of sales volume (Units) and sales revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. With both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding EUV Mask Defect Inspection Equipment.
Market Segmentation
By Company
Segment by Type
Segment by Application
By Region
Chapter Outline
Chapter 1: Introduces the report scope of the report, global total market size (value, volume and price). This chapter also provides the market dynamics, latest developments of the market, the driving factors and restrictive factors of the market, the challenges and risks faced by manufacturers in the industry, and the analysis of relevant policies in the industry.
Chapter 2: Detailed analysis of EUV Mask Defect Inspection Equipment manufacturers competitive landscape, price, sales and revenue market share, latest development plan, merger, and acquisition information, etc.
Chapter 3: Provides the analysis of various market segments by Type, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.
Chapter 4: Provides the analysis of various market segments by Application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.
Chapter 5: Sales, revenue of EUV Mask Defect Inspection Equipment in regional level. It provides a quantitative analysis of the market size and development potential of each region and introduces the market development, future development prospects, market space, and market size of each country in the world.
Chapter 6: Sales, revenue of EUV Mask Defect Inspection Equipment in country level. It provides sigmate data by Type, and by Application for each country/region.
Chapter 7: Provides profiles of key players, introducing the basic situation of the main companies in the market in detail, including product sales, revenue, price, gross margin, product introduction, recent development, etc.
Chapter 8: Analysis of industrial chain, including the upstream and downstream of the industry.
Chapter 9: Conclusion.