PUBLISHER: Allied Market Research | PRODUCT CODE: 1139925
PUBLISHER: Allied Market Research | PRODUCT CODE: 1139925
The extreme ultraviolet lithography systems market was valued at $8.04 billion in 2021, and is projected to reach $77.07 billion by 2031, registering a CAGR of 25.1% from 2022 to 2031. Extreme ultraviolet lithography is an optical lithography process that produces a design by exposing a reflective photomask to UV light and having it reflect onto a photoresist-covered substrate.
The growth of the EUVL system market is majorly driven by the technological superiority over other lithography techniques coupled with the rise in sale of microelectronics devices. Furthermore, the imminent requirement for size contraction in electronic devices is anticipated to drive market growth. However, complexities in developing proper photoresists and challenges in making the perfect mask are acting as a prime restraint of the market. On the contrary, the rise in trends of the Internet of Things is anticipated to provide lucrative opportunities for the expansion of the EUVL system market during the forecast period.
The extreme ultraviolet lithography systems market is segmented by equipment, light source, and region. On the basis of equipment, the market is divided into light sources, mirrors, helmets, and others. On the basis of the light sources, the market is bifurcated into laser produce plasmas (LPP), vacuum sparks, and gas discharges. Region-wise, the EUVL system market trends are analyzed across North America (the U.S., Canada, and Mexico), Europe (the UK, Germany, France, and the rest of Europe), Asia-Pacific (China, India, Japan, and the rest of the Asia-Pacific), and LAMEA (Latin America, the Middle East, and Africa).
The key players operating in the market include ASML, Canon, and Nikon.
Key Benefits For Stakeholders
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Key Market Segments
By Light Source
By Equipment
By Region