Global EUV Lithography Market - 2023-2030

Market Overview

The Global EUV Lithography Market size reached US$ 5.71 billion in 2022 and is expected to reach US$ 29.14 billion by 2030 growing at a CAGR of 22.6% during the forecast period 2023-2030.

The global EUV lithography market is experiencing rapid market growth, fueled by technological advancements, increasing adoption of memory and logic devices, collaborations and partnerships, the integration of AI and machine learning, and geographical expansion strategies. The aforementioned market trends are reshaping the semiconductor manufacturing landscape, driving the development of more market opportunities as well as advanced and efficient lithography processes. As the industry continues to evolve, businesses that stay ahead of these trends and seize emerging market opportunities stand to benefit from the growth and transformation of the EUV lithography market.

The global EUV lithography market is witnessing a surge in demand for semiconductors on a global scale due to significant expansion in the laser-produced plasma EUV lithography segment, which is anticipated to capture more than one-third of the market share within the application segment. Likewise, North America emerges as a dominant region, accounting for over two-fifths of the market share.

Market Dynamics

Technological Advancements and Supportive Government Policies

Continuous advancements in EUV lithography technology have played a pivotal role in driving market growth. Governments worldwide have acknowledged the importance of investing in research and development to enhance lithography systems. Governments worldwide have recognized the importance of nurturing the semiconductor industry and have implemented policies to support its development. For example, statistics reveal the provision of tax incentives, grants, and subsidies to encourage research, innovation, and the adoption of EUV lithography technology by domestic semiconductor manufacturers. Thus, technological advancements and supportive government policies act as major drivers for demand and market opportunities in the global EUV lithography market.

Regulatory and Safety Concerns, Yield Challenges and Reliability

The utilization of EUV lithography technology necessitates adherence to stringent safety protocols due to the hazardous nature of extreme ultraviolet radiation. Governments across the globe impose strict regulations and guidelines to ensure the safety of workers and the environment. Compliance with these regulations requires additional investments in safety measures, employee training, and monitoring systems, thereby impeding the market's growth. Official reports indicate that regulatory compliance accounts for a significant portion of the overall operational costs in the EUV lithography industry.

Furthermore, the implementation of EUV lithography introduces new challenges in achieving high production yields. The technology's sensitivity to minute defects in masks and light sources results in yield loss during the manufacturing process. The industry is striving to improve reliability and yield rates to meet the stringent requirements of semiconductor manufacturers, but it remains an ongoing challenge. Yield improvement initiatives require substantial investments in research and development, driving up the overall costs for manufacturers.

Segment Analysis

The global automotive oem coatings market is segmented based on light source, application, equipment and region.

Growing Semiconductor Demand, Advancement In Technology And Increase In Government Funding

The Laser Produced Plasma (LPP) segment has emerged as a critical component within the global EUV lithography market. By utilizing high-powered lasers, LPP technology generates extreme ultraviolet light, enabling the creation of more advanced semiconductor chips. Governmental statistics demonstrate the growing emphasis on LPP technology and its positive impact on the semiconductor industries of various countries.

The European Union (EU), for instance, has placed a strong emphasis on promoting advanced semiconductor manufacturing within its borders. In recent years, the EU has allocated significant funding to research projects focusing on LPP technology, aiming to strengthen its position in the global EUV lithography market. Furthermore, countries such as the U.S., Japan, South Korea, and Taiwan have also prioritized the advancement of LPP technology within their semiconductor industries.

Through strategic partnerships between governments, research institutions, and industry players, these nations have sought to enhance their competitiveness in the global market, fostering the growth of the LPP segment. As governments continue to support research and development in LPP technology and manufacturers drive further innovations, the LPP segment is poised for sustained growth. The aforementioned factors will play a pivotal role in advancing the semiconductor industry, enabling the production of smaller, more powerful, and more efficient electronic devices in the future.

Geographical Analysis

Governmental Support and Technological Advancements in North America

The North America region demonstrates a prominent presence in the global EUV lithography market, fueled by governmental support, technological advancements, and notable product launches. The U.S. and Canada, in particular, have witnessed positive growth in the semiconductor industry, leading to increased adoption of EUV lithography technology. For instance, Canada's semiconductor industry has experienced substantial growth in recent years, contributing to the North America region's EUV lithography market.

The Canadian government has actively supported the development of the semiconductor sector, emphasizing innovation and technological advancement. According to Statistics Canada, the manufacturing sales of electronic and electrical equipment, including semiconductors, increased by 8.5% in 2021, reflecting the industry's positive momentum. As the region continues to invest in research and development, it is expected to maintain its significant role in the global EUV lithography market, contributing to the advancement of the semiconductor industry as a whole.

Competitive Landscape

The major global players in the market include: ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc. and Vistec Semiconductor Systems.

Why Purchase the Report?

• To visualize the global EUV lithography market segmentation based on light source, application, equipment and region, as well as understand key commercial assets and players.
• Identify commercial opportunities by analyzing trends and co-development.
• Excel data sheet with numerous data points of EUV lithography market-level with all segments.
• PDF report consists of a comprehensive analysis after exhaustive qualitative interviews and an in-depth study.
• Product mapping available as Excel consisting of key products of all the major players.

The global EUV lithography market report would provide approximately 61 tables, 57 figures and 182 pages.

Target Audience 2023

• Manufacturers/ Buyers
• Industry Investors/Investment Bankers
• Research Professionals
• Emerging Companies