PUBLISHER: QYResearch | PRODUCT CODE: 1857084
PUBLISHER: QYResearch | PRODUCT CODE: 1857084
The global market for Photomask Pellicle was estimated to be worth US$ 884 million in 2024 and is forecast to a readjusted size of US$ 1493 million by 2031 with a CAGR of 7.8% during the forecast period 2025-2031.
The pellicle is a part of the photomask. As a covering, the pellicle is suspended above the photomask to form a physical barrier. Even if particles fall on it, they will not touch the mask itself. The pellicle can effectively prevent mask contamination and plays a vital role in improving production efficiency and chip quality.
A pellicle is a thin membrane stretched over an aluminum frame and glued to the photomask to protect it from contaminants, such as particles. Even if particles sit on the membrane, they are not printed on the wafer/ flat panel displays because they are out of focus during the exposure from the lithography process.
The process of preparing this Pellicle is also full of scientific and technological content. Usually, precise vacuum coating technology such as physical vapor deposition (PVD) or chemical vapor deposition (CVD) is used to form a uniform and dense film on the surface of the mask. This process requires precise control of parameters such as temperature, pressure and gas flow to ensure the quality and performance of the film.
Global key Photomask Pellicle players cover Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography, Inc., S&S Tech and INKO, etc. In terms of revenue, the global 3 largest companies occupied for a share nearly 85.67% in 2023.
From the perspective of downstream fields, the semiconductor field occupies a dominant position, accounting for about 74.17% in 2023. In semiconductor manufacturing, the role of this Pellicle is far more than simple physical protection. It can also effectively reduce the diffraction effect in the lithography process and improve the imaging quality. Especially in extreme ultraviolet lithography (EUVL) technology, due to the extremely short wavelength of the light source (about 13.5nm), the traditional penetrating mask can no longer be used. At this time, the reflective mask and its Pellicle have become the key technology.
It is worth noting that with the continuous advancement of chip manufacturing technology, the requirements for the mask Pellicle are getting higher and higher. For example, in advanced processes of 7nm and below, the size of the pattern on the mask may be only tens of nanometers, which puts extremely stringent requirements on the uniformity and defect control of the Pellicle.
Globally, Asia (especially China, Taiwan, and South Korea) dominates the mask protective film market. China is playing an increasingly important role in the world. As China develops in the field of semiconductor manufacturing, the demand for mask protective films in the region is also increasing.
This report aims to provide a comprehensive presentation of the global market for Photomask Pellicle, focusing on the total sales volume, sales revenue, price, key companies market share and ranking, together with an analysis of Photomask Pellicle by region & country, by Type, and by Application.
The Photomask Pellicle market size, estimations, and forecasts are provided in terms of sales volume (K Sqm) and sales revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. With both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Photomask Pellicle.
Market Segmentation
By Company
Segment by Type
Segment by Application
By Region
Chapter Outline
Chapter 1: Introduces the report scope of the report, global total market size (value, volume and price). This chapter also provides the market dynamics, latest developments of the market, the driving factors and restrictive factors of the market, the challenges and risks faced by manufacturers in the industry, and the analysis of relevant policies in the industry.
Chapter 2: Detailed analysis of Photomask Pellicle manufacturers competitive landscape, price, sales and revenue market share, latest development plan, merger, and acquisition information, etc.
Chapter 3: Provides the analysis of various market segments by Type, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.
Chapter 4: Provides the analysis of various market segments by Application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.
Chapter 5: Sales, revenue of Photomask Pellicle in regional level. It provides a quantitative analysis of the market size and development potential of each region and introduces the market development, future development prospects, market space, and market size of each country in the world.
Chapter 6: Sales, revenue of Photomask Pellicle in country level. It provides sigmate data by Type, and by Application for each country/region.
Chapter 7: Provides profiles of key players, introducing the basic situation of the main companies in the market in detail, including product sales, revenue, price, gross margin, product introduction, recent development, etc.
Chapter 8: Analysis of industrial chain, including the upstream and downstream of the industry.
Chapter 9: Conclusion.