PUBLISHER: AnalystView Market Insights | PRODUCT CODE: 1730729
PUBLISHER: AnalystView Market Insights | PRODUCT CODE: 1730729
EUV Pellicle Market size was valued at US$ 590.43 Million in 2024, expanding at a CAGR of 14.90% from 2025 to 2032.
An EUV pellicle is a protective film used in Extreme Ultraviolet (EUV) lithography, a state-of-the-art technology for fabricating semiconductor devices with minimal features. EUV lithography utilises light with an extremely short wavelength (13.5 nm) to etch patterns onto semiconductor wafers. However, the presence of dust and particles can significantly compromise the quality of the etched patterns. The EUV pellicle protects the photomask (a crucial element in the lithography process) from particle contamination while allowing EUV light to pass through. These pellicles are crafted from specialised, transparent materials capable of withstanding the intense EUV light without deteriorating. Their development is critical for ensuring high yields and precision in producing advanced semiconductors.
EUV Pellicle Market- Market Dynamics
The growing adoption of extreme ultraviolet (EUV) lithography in advanced semiconductor manufacturing is expected to propel market demand
The growing adoption of extreme ultraviolet (EUV) lithography in advanced semiconductor manufacturing is a key driver for the EUV pellicle market. As semiconductor manufacturers aim for smaller nodes, such as 5nm and beyond, EUV technology has become crucial for achieving high-resolution patterning. However, the efficiency of EUV lithography can be compromised by contamination from particles, which interfere with the patterning process. EUV pellicles serve as protective barriers, preventing particle contamination and improving production yields, which drives their increasing demand in the semiconductor industry. Innovations in pellicle materials and manufacturing processes are enhancing the reliability and performance of EUV pellicles. Traditional materials have faced challenges like low transmission rates and thermal stability under intense EUV exposure. However, developing high-transmission, durable pellicles made from advanced materials, such as carbon-based and silicon nitride structures, is overcoming these obstacles. These advancements help improve EUV throughput, reduce defect rates, and enhance overall lithography efficiency, further accelerating the growth of the EUV pellicle market.
EUV Pellicle Market- Key Insights
As per the analysis shared by our research analyst, the global market is estimated to grow annually at a CAGR of around 14.90% over the forecast period (2025-2032)
Based on Material Type segmentation, Carbon-based was predicted to show maximum market share in the year 2024
Based on application segmentation, semiconductor foundries were the leading application in 2024
On the basis of region, Asia Pacific was the leading revenue generator in 2024
The Global EUV Pellicle Market is segmented on the basis of Material Type, Application, End User, and Region.
The market is divided into two categories based on Material Type: Carbon-based and Silicon-based. The carbon-based segment also led the market, accounting for the largest revenue share in 2024, driven by its superior material properties and growing demand from semiconductor manufacturers. Carbon-based pellicles offer exceptional thermal stability, excellent optical transmittance at EUV wavelengths, and robust mechanical strength, making them ideal for protecting EUV masks during lithography processes. Additionally, key market players' ongoing research and development investments enhance carbon-based pellicles' performance and durability, further supporting market growth.
The market is divided into four categories based on application: Consumer Electronics, Semiconductor Foundries, Memory Devices, and Other Applications. In 2024, the semiconductor foundries segment led the market, capturing the largest revenue share, primarily driven by the growing demand for advanced semiconductor manufacturing processes. As the industry advances towards smaller nodes, such as 5nm and below, adopting extreme ultraviolet (EUV) lithography has become essential for achieving higher chip integration and performance. EUV pellicles play a pivotal role in protecting photomasks from particle contamination during the EUV lithography process, ensuring high production efficiency and yield. Foundries are increasingly investing in EUV infrastructure to maintain technological competitiveness and meet the demand for high-performance computing, artificial intelligence, and 5G applications.
EUV Pellicle Market- Geographical Insights
The Asia Pacific region dominated the global EUV pellicle market in 2024, holding the largest revenue share, due to its dominance in semiconductor fabrication. Countries such as Taiwan and South Korea lead in advanced chip production. The growing demand for high-performance computing (HPC) devices, AI applications, and 5G infrastructure drives the adoption of EUV lithography, thereby increasing the need for EUV pellicles. Government initiatives promoting semiconductor self-sufficiency, particularly in China and India, fuel market expansion. Additionally, robust collaborations between the region's semiconductor foundries and material suppliers are enhancing research and development efforts to improve the durability and efficiency of EUV pellicles.
In the EUV pellicle market, companies are adopting strategies focused on technological advancements and strategic partnerships to drive growth and innovation. Key players are investing heavily in R&D to develop next-generation pellicles that offer improved durability, transparency, and resistance to high-energy ultraviolet (EUV) light, essential for advanced semiconductor manufacturing processes. These technological improvements are aimed at enhancing the performance and longevity of EUV lithography systems. Additionally, many companies are forming strategic alliances with semiconductor manufacturers and equipment suppliers to ensure that their pellicles meet the stringent requirements of the semiconductor industry. Partnerships with industry giants allow for better integration of pellicles into EUV lithography tools, streamlining production and improving scalability. As the demand for more minor, more powerful semiconductor chips continues to rise, companies are also focusing on scaling production capacities to meet the market's growing needs. These strategies are helping companies position themselves as leaders in the rapidly evolving EUV pellicle market.
In December 2023, Imec and Mitsui Chemicals formed a strategic partnership to commercialize carbon nanotube (CNT) pellicle technology for EUV lithography. This collaboration leverages the unique properties of CNT pellicles, including enhanced transmittance, superior heat resistance, and increased mechanical durability, making them highly suitable for next-generation semiconductor manufacturing.
In May 2021, Mitsui Chemicals announced the commencement of commercial production of EUV pellicles at its Iwakuni-Ohtake Works. This milestone makes Mitsui Chemicals the world's first manufacturer of EUV pellicles.