PUBLISHER: Grand View Research | PRODUCT CODE: 1728011
PUBLISHER: Grand View Research | PRODUCT CODE: 1728011
The global EUV pellicle market size is anticipated to reach USD 1.6 billion by 2030 and is anticipated to grow at a CAGR of 14.4% from 2025 to 2030, according to a new report by Grand View Research, Inc.The market is being significantly driven by the increasing demand for advanced semiconductor manufacturing technologies. As the semiconductor industry shifts toward smaller process nodes such as 5nm, 3nm, and below, extreme ultraviolet lithography has become essential for achieving the high resolution and precision required in next-generation chip fabrication. EUV pellicles serve as critical components that protect photomasks from particle contamination during the lithography process, thereby improving yield rates and reducing defects. This has led to a growing emphasis on pellicle adoption as a standard solution in advanced semiconductor production environments.
Another key driver is the rapid expansion of consumer electronics and computing technologies, which require high-performance chips with enhanced efficiency and functionality. The proliferation of devices such as smartphones, tablets, wearables, and high-end personal computers, along with the integration of technologies like 5G, artificial intelligence, and the Internet of Things, has intensified the need for sophisticated semiconductor devices. As a result, chip manufacturers are increasingly investing in EUV lithography systems, thereby fueling demand for high-quality and reliable EUV pellicles to support high-volume production with minimal defects.
Technological advancements in pellicle materials are further contributing to the growth of the EUV pellicle market. Innovations such as carbon nanotube pellicles and other next-generation materials offer improved optical transmittance, thermal stability, and mechanical durability when compared to conventional alternatives. Strategic collaborations, such as the partnership between Imec and Mitsui Chemicals, are accelerating the development and commercialization of these advanced pellicle solutions. These innovations are enhancing the overall efficiency of EUV lithography and supporting the continued scaling of semiconductor devices.
The presence and active involvement of major industry participants is also playing a crucial role in driving the EUV pellicle market forward. Companies such as ASML Holding N.V., FUJIFILM Holdings Corporation, Entegris, and Shin-Etsu Chemical Co., Ltd. are heavily investing in research and development to improve pellicle performance and manufacturing scalability. These efforts are critical in addressing the growing complexity of semiconductor production, ensuring a stable supply chain, and meeting the increasing global demand for high-performance chips.